A Review of Different Etching Methodologies and Impact of various etchants in Wet Etching in Micro Fabrication

Abstract--The concept of miniaturization was introduced because of advancement in science and technology during 1980s. These miniaturized structures and designs are of high significance for making up with the macroscopic technology, for the sake of interfacing with microscopic world. The fabrication of micro structures and designs which are the advanced applications of micro fabrication are used for the process of micromachining structures in three dimensions as it is essential for interfacing with the nanotechnology. Micromachining which means performing cutting or grinding operations or selective removal of wafer to produce various structures has much important applications like accelerometers which are used to trigger air bags in cars. The lithography and etching processes are used to shape the bulk materials into microstructures in micro fabrication mechanism. Different ion bombardment techniques and chemical reactive mechanisms are used for a type of etching which is carried out in vacuum chamber, whereas chemical solutions are used for another type of etching mechanism whose procedures are finished in a bath. This survey illustrates different etching methodologies and the impact of various etchants in wet etching

Residual and Minimized Laplacian Residual Interpolation for Color Image Demosaicking – A Survey

Color image demosaicking could be an important image process operation for getting prime quality pictures. Demosaicking of color image can recreate a full color image from the unfinished color sample output of a picture sensing element. Attributable to the high price and maintenance, most of the colour sensing element cameras are prepared with CFA (Color Filter Array), it produces the mosaicked image. The colour filter array consists of three primary colors red inexperienced and blue and it samples only 1 color half at each element location. The method of estimating the extra 2 missing color parts at every component location is thought as demosaicking. The planned residual and reduced laplacian residual interpolation executes interpolation in residual domain. Wherever residual is that the distinction between witnessed and tentatively calculable component values. This technique yields higher correct results. Then the reconstructed image is assessed to search out the performance

Growth, structure and spectral studies of a novel mixed crystal potassium zinc manganese sulphate

Mixed crystals of K2Zn0.84 Mn0.16(SO4)2·6H2O were grown from an equimolar aqueous solution of Tutton's salt, K2 Zn(SO4)2·6H2O and MnSO4 by slow evaporation solution growth technique. The crystal composition as determined by single crystal XRD analysis reveals the co-existence of zinc and manganese in the mixed crystal. The surface morphological changes are observed by scanning electron microscopy. Small variations in cell parameter values, slight shifts in characteristic vibrational patterns in FT-IR and reduction in intensities observed in XRD confirm the crystal stress as a result of formation of mixed crystal. High resolution XRD diffraction estimates the crystalline perfection of the mixed crystal with predominantly vacancy type of defects. It belongs to P21/c space group with cell parameter values, a=6.1530 A, b=12.2230 A, c=9.0430 A, alpha=beta=nu=90°, V=657.56 A(3), Z=4. High transmittance in the visible region is observed

Synthesis and hole-transporting properties of highly fluorescent N-Aryl dithieno[3,2-b:2′3′-d]pyrrole-based oligomers

10.1021/jp909064nJournal of Physical Chemistry C114104628-463

Charge transport studies in fluorene - Dithieno[3,2-b:2′,3′-d]pyrrole oligomer using time-of-flight photoconductivity method

10.1016/j.orgel.2009.08.022Organic Electronics: physics, materials, applications1081534-154

Highly efficient electroluminescent biphenylyl-substituted poly(p-phenylenevinylene)s through fine tuning the polymer structure

10.1016/j.polymer.2006.01.069Polymer4761820-1829POLM